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毕业论文网 > 任务书 > 电子信息类 > 光电信息科学与工程 > 正文

超薄高质量MoS2薄膜的制备工艺研究任务书

 2020-04-29 19:55:48  

1. 毕业设计(论文)的内容和要求

本课题拟利用PLD技术优化工艺参数(温度、气压、激光功率等)制备出超薄、高结晶质量的MoS2薄膜,努力达到厚度及层数可控,以便用于制备FET。

2. 参考文献

1. Mingxu Fang Fang Wang Yemei Han Yulin Feng Tianling Ren Yue Li Dengxuan Tang Zhitang Song Kailiang Zhang, https://doi.org/10.1002/aelm.201700524. 2. Yen-Teng Ho, Chun-Hao Ma, Tien-Tung Luong, Lin-Lung Wei, Tzu-Chun Yen, Wei-Ting Hsu, Wen-Hao Chang, Yung-Ching Chu, Yung-Yi Tu, Krishna Prasad Pande, and Edward Yi Chang, Phys. Status Solidi RRL 9, No. 3, 187#8211;191 (2015) / DOI 10.1002/pssr.201409561. 3. Barvat, Arun, Prakash, Nisha, et. al., DOI: 10.1063/1.4991490. 4. Martha I. Serna Salvador Moreno Marissa Higgins Hyunjoo Choi Majid Minary‐Jolandan Manuel A. Quevedo‐Lopez, https://doi.org/10.1002/pssc.201600091. 5. Dattatray J. Late, Parvez A. Shaikh, Ruchita Khare, Ranjit V. Kashid, Minakshi Chaudhary, Mahendra A. More, and Satishchandra B. Ogale, dx.doi.org/10.1021/am503464h| ACS Appl. Mater. Interfaces 2014, 6, 15881#8722;15888. 6. Yen-Teng Ho ; Tzu-Chun Yen ; Tien-Tung Luong, et. al., DOI: 10.1109/CSTIC.2016.7464088. 7. Changbin Nie,Leyong Yu,Xingzhan Wei, et. al., DOI: 10.1088/1361-6528/aa7473. 8. Kobayashi, Takeshi,Akiyoshi, Hideki,Tachiki, Minoru, DOI: 10.1016/S0169-4332(02)00386-0.

3. 毕业设计(论文)进程安排

2018.12-2019.02,文献调研,翻译,开题报告; 2019.03-2019.04,薄膜制备、表征、分析工作; 2019.05-2019.06,论文撰写,答辩。

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